Advanced a-SiC Thin Films for Photonic Integrated Circuits (DC2) M/F

Organisation/Company CNRS Department Sciences et Ingénierie, Matériaux, Procédés Research Field Chemistry Physics Technology Researcher Profile First Stage Researcher (R1) Application Deadline 8 Apr 2026 - 23:59 (UTC) Country France Type of Contract Temporary Job Status Full-time Hours Per Week 35 Offer Starting Date 1 Oct 2026 Is the job funded through the EU Research Framework Programme? Horizon Europe - MSCA Is the Job related to staff position within a Research Infrastructure? No

Offer Description

SIMaP (Science et Ingénierie des Matériaux et Procédés – UMR 5266), a joint research unit of CNRS, Grenoble INP, and Université Grenoble Alpes, is a center of excellence in materials science and innovative processes. It spans diverse fields—from metallurgy to nanomaterials and energy materials—and is equipped with state-of-the‑art research facilities.Embedded in a dynamic network of industrial and academic collaborations, SIMaP provides an ideal environment for ambitious doctoral research, supported by rigorous scientific supervision. The team hosting the PhD candidate is internationally recognized for its expertise in materials science and process engineering, particularly in thin films.

As a participant in the SiCPIC project, the PhD student will become part of a team at CNRS-Grenoble INP, with expertise in synthesis and characterization of thin films for functional applications. The activities within the project will benefit from synergies with other projects in the group as well as with other activities at the institute.

CNRS-Grenoble INP-Université Grenoble Alpes seeks a highly motivated candidate for a fully funded 36-month PhD position focused on thin‑film deposition for photonic applications.This position is part of the "Silicon Carbide Photonic Integrated Circuit (SiCPIC)" project, a prestigious European Doctoral Network funded by the EU's Horizon Europe program under the Marie Sklodowska‑Curie Action (MSCA, Grant Agreement No. ).

• International collaboration: The PhD candidate will join a team of 15 doctoral researchers across five European countries, partnering with five universities and industrial partners.
• Industrial partnership: The thesis is conducted in collaboration with PlasmaTherm Europe.
• Research focus: All 15 PhD projects fall under the project theme of Silicon Carbide on Insulator (SiCOI) devices and integration for applications in classic and quantum optical telecommunication and optical sensing.

For amorphous SiCOI stacks the identification of the best processing route exhibiting the most favourable optical properties is important. The understanding of the links between the structural properties of the thin films and the optical/electrical properties is of key importance to design highly efficient and reproducible photonics devices. To achieve this goal, the doctoral candidate will investigate the optimisation of inductive coupled plasma chemical vapor deposition (ICPCVD) and plasma enhanced chemical vapor deposition (PECVD) thin films. A methodical approach, combining advanced experiments and Design of Experiments (DoE), will explore links between deposition parameters, film chemistry, and optical/electrical properties. Special focus will be given to annealing effects (laser/thermal) on stability and performance, using ex‑situ and in‑situ characterization.The candidate will be trained in plasma process engineering (ICPCVD/PECVD), experimental design (statistical/numerical methods), and multi‑scale thin‑film characterization (structural, chemical and optical characterisations).

Expected outcomes:

• Deep understanding of ICPCVD/PECVD deposition mechanisms and the links with the film physico‑chemistry (structure, stress, composition), and optoelectronic properties.
• Optimisation of post‑deposition annealing (laser/thermal) to enhance device stability and performance.
• Contribution to a‑SiC integration in classical/quantum photonic circuits, in synergy with academic and industrial partners.

Qualifications: Candidates must have a two‑year master's degree or a similar degree with an academic level equivalent to a two‑year master’s degree in material science, process engineering or similar.

Skills : Critical thinking, Research design, Presentation abilities, Teamwork, Time management, Organisation and Interdisciplinary approach. Good skills in numerical methods and statistical analysis is required, very good English (written/spoken).