ALD Process and Thin-Film Reasoning Evaluator

IXO is seeking practical ALD knowledge that helps distinguish a physically credible process explanation from a fluent but incorrect one. You will examine deposition problems at the level of process choices, surface reactions and the measurements used to assess a film.

Work you will do

• Create and solve technical problems in ALD process development, semiconductor processing and thin-film characterization.
• Review scientific outputs for mistakes about precursor behavior, surface-reaction mechanisms and process optimization.
• Rank alternative responses against defined scientific criteria, explaining the reasons for the judgment.
• Organize process settings, recipes and characterization results into clear evaluation records with the context needed for meaningful interpretation.

Preferred background

• Hands-on development, optimization or troubleshooting of ALD processes.
• Deep familiarity with deposition for semiconductors or advanced packaging, precursor chemistry and surface reactions.
• Practical characterization using methods such as XRD, SEM, TEM, XPS or ellipsometry.
• PhD/Masters or equivalent practical experience in materials science, chemistry, chemical engineering or physics.
• Precise, concise scientific writing in English.

Original ALD tasks and solutions, rubric-based comparative reviews and organized process/measurement evidence.

Location and schedule

Remote; United States residence applies to this track. Planning availability is 10–40 hours a week; IXO confirms the actual scope, duration and schedule before work.

Pay and working terms

$89/hr USD. IXO will agree the assignment scope, hourly rate, schedule and acceptance criteria before work begins. Work is a paid remote expert engagement; applying does not guarantee an assignment. Use only public, licensed or otherwise authorized material. Do not provide confidential employer information, personal data or restricted research.